Micro Solar Cell Project

Photoresist

When a positive PR is exposed to UV light, it becomes more soluble to the developer. The developed patten is identical to the mask pattern.

Two basic oxidation methods: dry and wet.

dry: slow process, higher quality oxide

wet: quick process for thicker oxide layer, lower quality

Normally, the oxide layer is 100nm-1.5um

Typical thickness of native oxide layer is on the order of 20-30nm