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0. Clean wafer first (Heat)
1. Spinner
Apply HMDS--drop in the middle of the wafer, as glue for PR 1813
Operate Spinner, 3000RPM, 15s
2. Heat, 30s, 120 Celsius
3. PR 1813, deposit PR, 3000RPM, 30s in spinner
No bubbles!! No white light, use only yellow light(when using PR)
4. Hot plate, 1~1.5min, 120 Celsius
Lithography:
Mask(chrome)
mirror side on top
when moving wafer, make sure "separate" state
2.5 min, DO NOT look at UV light
Contact mode, 3 min sharp
Develop:
Solution 319
Wash it under water, dry it with Nitrogen gun
Watch the pattern under microscopy
Heat it again (to harden it): 200 Celsius, 24 min
BOE(Buffer Oxide Etching), remove SiO2
Stripper ( Solution) 1165, remove PR
PS....
319 is to remove the UV exposed part of the PR while the 1165 is used for removing the unexposed part of the PR.
and we'are using wet oxidation for the wafers, cause it should be really thick.
Mon, 15 Jun 2020 01:41:31 -0600
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Mon, 19 Sep 2022 23:57:59 -0600
How was your first day. Is it really good for you. benefits of CBD Everything was ok for you. It is good that you have done everything correctly as mentioned in the post. Happy to know that. Thank you so much.
Wed, 30 Nov 2022 23:03:18 -0700
Today is my first day in the clean room, and I have to say that I'm impressed! Everything is so clean and organized, and all the equipment looks very high-tech. I'm looking forward to learning more about how to use all of this equipment and San Juan Capistrano’s Délice Breton hopefully becoming more familiar with the process of semiconductor fabrication.
Fri, 24 Feb 2023 02:29:53 -0700
It was an exciting first day in the clean room! I was filled with anticipation as I stepped into the pristine environment with its controlled atmosphere and restricted access. I was immediately gout treatment taken by the attention to detail and precision that was evident throughout the facility. I was also impressed by the commitment to safety and the strict protocols that are in place. It was a great start to my new adventure and I'm looking forward to learning more about this unique and specialized environment!
Thu, 30 Mar 2023 06:59:14 -0600
It was my first day in the clean room and it was an eye-opening experience. I learned how to properly handle a wafer, how to apply HMDS, and how to operate the spinner. I was also taught the importance of not having Lab grown diamonds any bubbles and only using yellow light when using PR 1813. The process was finished off with a hot plate for 1-1.5 minutes at 120 Celsius. I'm excited to see what else I can learn and experience in this clean room!